Experts, current and future users of high-resolution computed tomography (CT) are invited to attend the 2010 International CT Symposium, sponsored by phoenix|x-ray, a part of GE Sensing & Inspection Technologies, in Dresden from August 31 – September 2. The event will be a forum for conversation and discussion regarding latest developments in CT technology and analysis methods, as well as the future of CT technology around the world, addressing research and industry topics, including material science, geology, biomedicine, 3D metrology, sensors and electronics.
CT X-ray technology with micron and sub-micron voxel resolutions has become a powerful inspection tool for a variety of inspections in research and industrial practice. In virtually all non-destructive testing application fields, dimensional measurement or microstructure analysis using CT leads to increased awareness and significant productivity improvements.
All interested parties are invited to submit abstracts to present at the conference, pending the April 30, 2010 deadline. The symposium is an opportunity to gain insight into the unique and versatile applications of high-resolution CT and to benefit from the knowledge of experienced users.
To register for the symposium or submit an abstract for a paper, please visit Phoenix X-Ray.
- Symposium Overview
- International X-ray CT Symposium for High-Resolution Micro- and Nanofocus Computed Tomography
- August 31 - September 2, 2010
- Dresden, Germany
- Abstract deadline: April 30, 2010
- Organized by phoenix|x-ray, a product line of GE Sensing & Inspection Technologies